A. V. Rakov
About
A. V. Rakov has authored 71 papers that have received a total of 628 indexed citations.
This includes 43 papers in Surfaces, Coatings and Films, 30 papers in Electrical and Electronic Engineering and 26 papers in Atomic and Molecular Physics, and Optics. The topics of these papers are Electron and X-Ray Spectroscopy Techniques (42 papers), Advancements in Photolithography Techniques (18 papers) and Force Microscopy Techniques and Applications (15 papers). A. V. Rakov is often cited by papers focused on Electron and X-Ray Spectroscopy Techniques (42 papers), Advancements in Photolithography Techniques (18 papers) and Force Microscopy Techniques and Applications (15 papers) and collaborates with scholars based in Russia, United States and Hong Kong. A. V. Rakov's co-authors include Yu. A. Novikov, П. А. Тодуа, В. П. Гавриленко, М. Н. Филиппов and K. A. Valiev and has published in prestigious journals such as Ultramicroscopy, Measurement Science and Technology and JETP Letters
In The Last Decade
Explore authors with similar magnitude of impact
Top authors papers by O. Anselem are co-authored with Top authors papers by Chao Yin are co-authored with Top fields papers by Irena Zdovc are about Top fields papers by Kaihong Zheng are about Top fields papers by Chao Fang are about Top countries impacted by papers by Alexander V. Vasiliev Top authors papers by M. Nomachi are co-authored with Top authors papers by Qian Lin are co-authored with