C. Witt
About
C. Witt has authored 24 papers that have received a total of 635 indexed citations.
This includes 18 papers in Electrical and Electronic Engineering, 18 papers in Electronic, Optical and Magnetic Materials and 8 papers in Materials Chemistry. The topics of these papers are Copper Interconnects and Reliability (18 papers), Electrodeposition and Electroless Coatings (8 papers) and Semiconductor materials and devices (7 papers). C. Witt is often cited by papers focused on Copper Interconnects and Reliability (18 papers), Electrodeposition and Electroless Coatings (8 papers) and Semiconductor materials and devices (7 papers) and collaborates with scholars based in United States, Germany and China. C. Witt's co-authors include D. Josell, Daniel Wheeler, Thomas P. Moffat, R. Rosenberg and T. P. Moffat and has published in prestigious journals such as Angewandte Chemie International Edition, ACS Nano and Applied Physics Letters
In The Last Decade
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