D. Josell
About
D. Josell has authored 150 papers that have received a total of 4.6k indexed citations.
This includes 95 papers in Electrical and Electronic Engineering, 54 papers in Materials Chemistry and 41 papers in Atomic and Molecular Physics, and Optics. The topics of these papers are Electrodeposition and Electroless Coatings (69 papers), Copper Interconnects and Reliability (36 papers) and Semiconductor materials and interfaces (27 papers). D. Josell is often cited by papers focused on Electrodeposition and Electroless Coatings (69 papers), Copper Interconnects and Reliability (36 papers) and Semiconductor materials and interfaces (27 papers) and collaborates with scholars based in United States, South Korea and Egypt. D. Josell's co-authors include Thomas P. Moffat, Daniel Wheeler, John E. Bonevich, D. Van Heerden and Trevor Michael Braun and has published in prestigious journals such as Physical Review Letters, Journal of Geophysical Research Atmospheres and Accounts of Chemical Research
In The Last Decade
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