Daniel Adams
About
Daniel Adams has authored 43 papers that have received a total of 686 indexed citations.
This includes 27 papers in Electrical and Electronic Engineering, 22 papers in Electronic, Optical and Magnetic Materials and 11 papers in Materials Chemistry. The topics of these papers are Copper Interconnects and Reliability (22 papers), Semiconductor materials and devices (21 papers) and Metal and Thin Film Mechanics (8 papers). Daniel Adams is often cited by papers focused on Copper Interconnects and Reliability (22 papers), Semiconductor materials and devices (21 papers) and Metal and Thin Film Mechanics (8 papers) and collaborates with scholars based in United States, South Africa and Japan. Daniel Adams's co-authors include T. L. Alford, J. W. Mayer, Stephen W. Russell, N. David Theodore and Gerald F. Malgas and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society
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