Donald C. Hofer
About
Donald C. Hofer has authored 42 papers that have received a total of 616 indexed citations.
This includes 35 papers in Electrical and Electronic Engineering, 18 papers in Biomedical Engineering and 10 papers in Surfaces, Coatings and Films. The topics of these papers are Advancements in Photolithography Techniques (33 papers), Nanofabrication and Lithography Techniques (16 papers) and Semiconductor materials and devices (12 papers). Donald C. Hofer is often cited by papers focused on Advancements in Photolithography Techniques (33 papers), Nanofabrication and Lithography Techniques (16 papers) and Semiconductor materials and devices (12 papers) and collaborates with scholars based in United States, Germany and France. Donald C. Hofer's co-authors include Robert D. Allen, Gregory M. Wallraff, Roderick R. Kunz, Ratnam Sooriyakumaran and Gregory Breyta and has published in prestigious journals such as Applied Physics Letters, Macromolecules and The Journal of Physical Chemistry
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