G. Ruhl
About
G. Ruhl has authored 41 papers that have received a total of 670 indexed citations.
This includes 38 papers in Electrical and Electronic Engineering, 17 papers in Materials Chemistry and 13 papers in Electronic, Optical and Magnetic Materials. The topics of these papers are Semiconductor materials and devices (23 papers), Copper Interconnects and Reliability (13 papers) and Advancements in Photolithography Techniques (12 papers). G. Ruhl is often cited by papers focused on Semiconductor materials and devices (23 papers), Copper Interconnects and Reliability (13 papers) and Advancements in Photolithography Techniques (12 papers) and collaborates with scholars based in Germany, United States and Lithuania. G. Ruhl's co-authors include Christian Wenger, Mindaugas Lukosius, Tom Blomberg, I. Costina and P. K. Baumann and has published in prestigious journals such as ACS Nano, Chemistry of Materials and Nanoscale
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