Hans Loeschner
About
Hans Loeschner has authored 63 papers that have received a total of 466 indexed citations.
This includes 53 papers in Electrical and Electronic Engineering, 38 papers in Biomedical Engineering and 21 papers in Surfaces, Coatings and Films. The topics of these papers are Advancements in Photolithography Techniques (47 papers), Chemical Mechanical Polishing in Microelectronics Manufacturing (23 papers) and Integrated Circuits and Semiconductor Failure Analysis (21 papers). Hans Loeschner is often cited by papers focused on Advancements in Photolithography Techniques (47 papers), Chemical Mechanical Polishing in Microelectronics Manufacturing (23 papers) and Integrated Circuits and Semiconductor Failure Analysis (21 papers) and collaborates with scholars based in Germany, Austria and United States. Hans Loeschner's co-authors include Elmar Platzgummer, Christof Klein, Florian Letzkus, W.H. Bruenger and Martin Witt and has published in prestigious journals such as Advanced Materials, Japanese Journal of Applied Physics and Surface and Coatings Technology
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