Jeff D. Byers
About
Jeff D. Byers has authored 47 papers that have received a total of 363 indexed citations.
This includes 36 papers in Electrical and Electronic Engineering, 16 papers in Biomedical Engineering and 12 papers in Surfaces, Coatings and Films. The topics of these papers are Advancements in Photolithography Techniques (34 papers), Electron and X-Ray Spectroscopy Techniques (11 papers) and Nanofabrication and Lithography Techniques (8 papers). Jeff D. Byers is often cited by papers focused on Advancements in Photolithography Techniques (34 papers), Electron and X-Ray Spectroscopy Techniques (11 papers) and Nanofabrication and Lithography Techniques (8 papers) and collaborates with scholars based in United States, Canada and Bulgaria. Jeff D. Byers's co-authors include C. Grant Willson, Chris A. Mack, John S. Petersen, Mark Somervell and R. Andrew McGill and has published in prestigious journals such as Nature Physics, Biophysical Journal and AIP Advances
In The Last Decade
Explore authors with similar magnitude of impact
Top countries impacted by papers by Qianqian Deng Top countries impacted by papers by Shuangshuang Liu Top authors papers by Gian Enrico Magi are co-authored with Top fields papers by Peng‐Fei Zheng are about Top authors papers by P.W. Shi are co-authored with Top journals papers by Jinhao Liang are published in Top fields papers by Vesna Tomic‐Spiric are about Top authors papers by F Válić are co-authored with