Jeffrey D. Gelorme
About
Jeffrey D. Gelorme has authored 20 papers that have received a total of 1.1k indexed citations.
This includes 20 papers in Electrical and Electronic Engineering, 7 papers in Biomedical Engineering and 4 papers in Surfaces, Coatings and Films. The topics of these papers are Advancements in Photolithography Techniques (12 papers), Nanofabrication and Lithography Techniques (5 papers) and Integrated Circuits and Semiconductor Failure Analysis (4 papers). Jeffrey D. Gelorme is often cited by papers focused on Advancements in Photolithography Techniques (12 papers), Nanofabrication and Lithography Techniques (5 papers) and Integrated Circuits and Semiconductor Failure Analysis (4 papers) and collaborates with scholars based in United States and Switzerland. Jeffrey D. Gelorme's co-authors include N. LaBianca, Laura L. Kosbar, Will Conley, William R. Brunsvold and Modest M. Oprysko and has published in prestigious journals such as Applied Physics Letters, IBM Journal of Research and Development and Journal of Industrial Ecology
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