John L. Sturtevant
About
John L. Sturtevant has authored 78 papers that have received a total of 330 indexed citations.
This includes 74 papers in Electrical and Electronic Engineering, 28 papers in Surfaces, Coatings and Films and 23 papers in Industrial and Manufacturing Engineering. The topics of these papers are Advancements in Photolithography Techniques (74 papers), Integrated Circuits and Semiconductor Failure Analysis (24 papers) and Industrial Vision Systems and Defect Detection (23 papers). John L. Sturtevant is often cited by papers focused on Advancements in Photolithography Techniques (74 papers), Integrated Circuits and Semiconductor Failure Analysis (24 papers) and Industrial Vision Systems and Defect Detection (23 papers) and collaborates with scholars based in United States, Japan and Hungary. John L. Sturtevant's co-authors include Thuy Do, Peter De Bisschop, Hiroyuki Shindo, Edita Tejnil and Yuri Granik and has published in prestigious journals such as Macromolecules, Journal of Chemical Education and Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
In The Last Decade
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