John N. Helbert
About
John N. Helbert has authored 29 papers that have received a total of 362 indexed citations.
This includes 14 papers in Electrical and Electronic Engineering, 9 papers in Materials Chemistry and 9 papers in Surfaces, Coatings and Films. The topics of these papers are Advancements in Photolithography Techniques (10 papers), Electron and X-Ray Spectroscopy Techniques (9 papers) and Semiconductor materials and devices (9 papers). John N. Helbert is often cited by papers focused on Advancements in Photolithography Techniques (10 papers), Electron and X-Ray Spectroscopy Techniques (9 papers) and Semiconductor materials and devices (9 papers) and collaborates with scholars based in United States. John N. Helbert's co-authors include Edward H. Poindexter, Charles U. Pittman, Burkhard E. Wagner, Larry Kevan and Charles F. Cook and has published in prestigious journals such as Journal of the American Chemical Society, The Journal of Chemical Physics and Macromolecules
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