N. Ohashi
About
N. Ohashi has authored 12 papers that have received a total of 203 indexed citations.
This includes 10 papers in Electrical and Electronic Engineering, 7 papers in Electronic, Optical and Magnetic Materials and 3 papers in Biomedical Engineering. The topics of these papers are Copper Interconnects and Reliability (7 papers), Semiconductor materials and devices (5 papers) and Chemical Mechanical Polishing in Microelectronics Manufacturing (3 papers). N. Ohashi is often cited by papers focused on Copper Interconnects and Reliability (7 papers), Semiconductor materials and devices (5 papers) and Chemical Mechanical Polishing in Microelectronics Manufacturing (3 papers) and collaborates with scholars based in Japan and United States. N. Ohashi's co-authors include Yoshio Homma, Seiichi Kondo, J. Noguchi, Ken’ichi Takeda and Shigeki Hirasawa and has published in prestigious journals such as Journal of The Electrochemical Society, IEEE Transactions on Electron Devices and Japanese Journal of Applied Physics
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