Neal Lafferty
About
Neal Lafferty has authored 34 papers that have received a total of 284 indexed citations.
This includes 30 papers in Electrical and Electronic Engineering, 20 papers in Biomedical Engineering and 7 papers in Surfaces, Coatings and Films. The topics of these papers are Advancements in Photolithography Techniques (27 papers), Integrated Circuits and Semiconductor Failure Analysis (7 papers) and Chemical Mechanical Polishing in Microelectronics Manufacturing (7 papers). Neal Lafferty is often cited by papers focused on Advancements in Photolithography Techniques (27 papers), Integrated Circuits and Semiconductor Failure Analysis (7 papers) and Chemical Mechanical Polishing in Microelectronics Manufacturing (7 papers) and collaborates with scholars based in United States, Hungary and Belgium. Neal Lafferty's co-authors include Bruce W. Smith, Kafai Lai, Chi‐Chun Liu, Lars W. Liebmann and Paul Zimmerman and has published in prestigious journals such as Journal of Micro/Nanolithography MEMS and MOEMS
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