Nobutoshi Fujii
About
Nobutoshi Fujii has authored 23 papers that have received a total of 317 indexed citations.
This includes 14 papers in Electrical and Electronic Engineering, 14 papers in Electronic, Optical and Magnetic Materials and 12 papers in Materials Chemistry. The topics of these papers are Copper Interconnects and Reliability (14 papers), Mesoporous Materials and Catalysis (11 papers) and Semiconductor materials and devices (8 papers). Nobutoshi Fujii is often cited by papers focused on Copper Interconnects and Reliability (14 papers), Mesoporous Materials and Catalysis (11 papers) and Semiconductor materials and devices (8 papers) and collaborates with scholars based in Japan, Taiwan and India. Nobutoshi Fujii's co-authors include Takamaro Kikkawa, Nobuhiro Hata, Hirofumi Tanaka, Yutaka Seino and Hayato Iwamoto and has published in prestigious journals such as Journal of Applied Physics, Journal of The Electrochemical Society and Thin Solid Films
In The Last Decade
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