O.F.J. Noordman
About
O.F.J. Noordman has authored 21 papers that have received a total of 454 indexed citations.
This includes 12 papers in Electrical and Electronic Engineering, 7 papers in Atomic and Molecular Physics, and Optics and 6 papers in Biomedical Engineering. The topics of these papers are Advancements in Photolithography Techniques (7 papers), Integrated Circuits and Semiconductor Failure Analysis (6 papers) and Photorefractive and Nonlinear Optics (4 papers). O.F.J. Noordman is often cited by papers focused on Advancements in Photolithography Techniques (7 papers), Integrated Circuits and Semiconductor Failure Analysis (6 papers) and Photorefractive and Nonlinear Optics (4 papers) and collaborates with scholars based in The Netherlands, Germany and United States. O.F.J. Noordman's co-authors include N.F. van Hulst, Michael Patra, Johan F. J. Engbersen, B. Bölger and M.H.P. Moers and has published in prestigious journals such as Journal of the American Chemical Society, Applied Physics Letters and Chemistry of Materials
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