Ralf K. Heilmann
About
Ralf K. Heilmann has authored 123 papers that have received a total of 1.6k indexed citations.
This includes 46 papers in Electrical and Electronic Engineering, 41 papers in Surfaces, Coatings and Films and 36 papers in Radiation. The topics of these papers are Optical Coatings and Gratings (38 papers), Advanced X-ray Imaging Techniques (34 papers) and Chemical Mechanical Polishing in Microelectronics Manufacturing (30 papers). Ralf K. Heilmann is often cited by papers focused on Optical Coatings and Gratings (38 papers), Advanced X-ray Imaging Techniques (34 papers) and Chemical Mechanical Polishing in Microelectronics Manufacturing (30 papers) and collaborates with scholars based in United States, Germany and Singapore. Ralf K. Heilmann's co-authors include Mark L. Schattenburg, Paul T. Konkola, Chih‐Hao Chang, Carl G. Chen and Minseung Ahn and has published in prestigious journals such as Physical Review Letters, The Journal of Chemical Physics and The Astrophysical Journal
In The Last Decade
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