Shih-Chang Liang
About
Shih-Chang Liang has authored 20 papers that have received a total of 671 indexed citations.
This includes 19 papers in Materials Chemistry, 11 papers in Electrical and Electronic Engineering and 7 papers in Mechanics of Materials. The topics of these papers are Copper-based nanomaterials and applications (11 papers), Chalcogenide Semiconductor Thin Films (9 papers) and Metal and Thin Film Mechanics (7 papers). Shih-Chang Liang is often cited by papers focused on Copper-based nanomaterials and applications (11 papers), Chalcogenide Semiconductor Thin Films (9 papers) and Metal and Thin Film Mechanics (7 papers) and collaborates with scholars based in Taiwan. Shih-Chang Liang's co-authors include Fuh‐Sheng Shieu, Zue‐Chin Chang, Du‐Cheng Tsai, Yi‐Chen Lin and Nen‐Wen Pu and has published in prestigious journals such as Applied Physics Letters, Journal of The Electrochemical Society and Applied Surface Science
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