Uwe Hollerbach
About
Uwe Hollerbach has authored 37 papers that have received a total of 364 indexed citations.
This includes 29 papers in Electrical and Electronic Engineering, 22 papers in Biomedical Engineering and 7 papers in Atomic and Molecular Physics, and Optics. The topics of these papers are Advancements in Photolithography Techniques (29 papers), Nanofabrication and Lithography Techniques (11 papers) and Chemical Mechanical Polishing in Microelectronics Manufacturing (10 papers). Uwe Hollerbach is often cited by papers focused on Advancements in Photolithography Techniques (29 papers), Nanofabrication and Lithography Techniques (11 papers) and Chemical Mechanical Polishing in Microelectronics Manufacturing (10 papers) and collaborates with scholars based in United States, Israel and The Netherlands. Uwe Hollerbach's co-authors include Bob Eisenberg, Robert Socha, Eytan Barouch, Steven A. Orszag and Xuelong Shi and has published in prestigious journals such as Langmuir, Japanese Journal of Applied Physics and IEEE Electron Device Letters.
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