W. Neff

58 papers and 624 indexed citations i.

W. Neff has authored 58 papers that have received a total of 624 indexed citations. This includes 39 papers in Electrical and Electronic Engineering, 26 papers in Atomic and Molecular Physics, and Optics and 15 papers in Nuclear and High Energy Physics. The topics of these papers are Advancements in Photolithography Techniques (18 papers), Plasma Diagnostics and Applications (17 papers) and Atomic and Molecular Physics (16 papers). W. Neff is often cited by papers focused on Advancements in Photolithography Techniques (18 papers), Plasma Diagnostics and Applications (17 papers) and Atomic and Molecular Physics (16 papers) and collaborates with scholars based in Germany, Finland and Romania. W. Neff's co-authors include R. Lebert, K. Bergmann, Jeroen Jonkers, Guido Schriever and H. Krompholz and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of Physics D Applied Physics