Plasma Chemistry and Plasma Processing

2.2k papers and 49.3k indexed citations i.

The 2.2k papers published in Plasma Chemistry and Plasma Processing in the last decades have received a total of 49.3k indexed citations. Papers published in Plasma Chemistry and Plasma Processing usually cover Electrical and Electronic Engineering (1.2k papers), Radiology, Nuclear Medicine and Imaging (1.0k papers) and Materials Chemistry (836 papers) specifically the topics of Plasma Applications and Diagnostics (1.0k papers), Plasma Diagnostics and Applications (720 papers) and Catalytic Processes in Materials Science (464 papers). The most active scholars publishing in Plasma Chemistry and Plasma Processing are E. Pfender, P. Fauchais, Anthony B. Murphy, Maher I. Boulos and J. Heberlein.