Stefan Wurm
About
Stefan Wurm has authored 57 papers that have received a total of 601 indexed citations.
This includes 50 papers in Electrical and Electronic Engineering, 33 papers in Surfaces, Coatings and Films and 10 papers in Biomedical Engineering. The topics of these papers are Advancements in Photolithography Techniques (44 papers), Electron and X-Ray Spectroscopy Techniques (32 papers) and Integrated Circuits and Semiconductor Failure Analysis (25 papers). Stefan Wurm is often cited by papers focused on Advancements in Photolithography Techniques (44 papers), Electron and X-Ray Spectroscopy Techniques (32 papers) and Integrated Circuits and Semiconductor Failure Analysis (25 papers) and collaborates with scholars based in United States, Germany and South Korea. Stefan Wurm's co-authors include Patrick Naulleau, Kenneth A. Goldberg, Frank Goodwin, Warren Montgomery and Andy Ma and has published in prestigious journals such as Physical Review Letters, The Journal of Chemical Physics and Applied Physics Letters
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