T. L. Alford
About
T. L. Alford has authored 269 papers that have received a total of 4.9k indexed citations.
This includes 197 papers in Electrical and Electronic Engineering, 94 papers in Materials Chemistry and 74 papers in Electronic, Optical and Magnetic Materials. The topics of these papers are Semiconductor materials and devices (87 papers), Copper Interconnects and Reliability (66 papers) and Plasmonics for Photovoltaic Devices (43 papers). T. L. Alford is often cited by papers focused on Semiconductor materials and devices (87 papers), Copper Interconnects and Reliability (66 papers) and Plasmonics for Photovoltaic Devices (43 papers) and collaborates with scholars based in United States, China and Nigeria. T. L. Alford's co-authors include N. David Theodore, J. W. Mayer, S. S. Lau, Stephen W. Russell and Daniel Adams and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Langmuir
In The Last Decade
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